In the method, as shown in
Next, as shown in
To be specific, the first base insulating layer 26 is formed on the metal supporting board 8 in a pattern corresponding to the first terminal region-insulating layer 28, the one pair of first front-side base layers 29 (ref:
In order to form the first base insulating layer 26 including the first terminal region-insulating layer 28, the one pair of first front-side base layers 29 (ref:
Thereafter, the obtained base film is exposed to light via a photomask that is not shown. The photomask includes a light shielding portion and a light fully transmitting portion in a pattern. The light fully transmitting portion to a portion where the first base insulating layer 26 is formed and the light shielding portion to a portion where the first base insulating layer 26 is not formed are disposed in opposed relation to the base film to be then exposed to light.