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Integrated high side gate driver structure and circuit for driving high side power transistors

專(zhuān)利號(hào)
US10096705B2
公開(kāi)日期
2018-10-09
申請(qǐng)人
Infineon Technologies Austria AG(AT Villach)
發(fā)明人
Allan Nogueras Nielsen; Mikkel H?yerby
IPC分類(lèi)
H03F3/217; H01L29/78; H01L21/8238; H01L21/761; H01L27/06; H03K17/687
技術(shù)領(lǐng)域
driver,voltage,gate,transistor,diffusion,dc,high,ldnmos,class,supply
地域: Villach

摘要

An integrated high side gate driver structure for driving a power transistor. The structure includes a semiconductor substrate having a first polarity semiconductor material in which a first well diffusion including a second polarity semiconductor material is formed. An outer wall of the first well diffusion is abutted to the substrate. A second well diffusion, having first polarity semiconductor material, is arranged inside the first well diffusion such that an outer wall of the second well diffusion abuts an inner wall of the first well diffusion. The structure includes a gate driver having high side positive and negative supply voltage ports, and a driver input and output. The gate driver includes a transistor driver in the second well diffusion such that control and output terminals of the transistor driver are coupled to the driver input and output, respectively. The structure also includes respective electrical connections between the first and second well diffusions and the negative supply voltage port.

說(shuō)明書(shū)

A pulse width modulated audio signal is supplied to a driver input of the gate driver circuit 103 via a level shifter 111. Hence, a level shifted replica of this pulse width modulated audio signal is supplied to the gate of the NMOS power transistor 107 via the driver output 104 of the gate driver circuit 103. The prior art gate driver circuit 103 is placed in a traditional well-structure of a semiconductor substrate into which the class D output stage 100 is integrated. This traditional well-structure has a parasitic well capacitance (not shown) coupled from the well structure to the semiconductor substrate. The traditional well-structure must furthermore be tied to the highest DC voltage potential of the prior art gate driver circuit 103 as explained below which has the undesired effect that the parasitic well capacitance becomes coupled to the high DC voltage GVDD_FLOAT at the high side positive supply voltage port 106a. The formation of the parasitic well capacitance creates numerous problems with the stability of the regulated DC voltage and makes the presence of a relatively large, and therefore, external regulator capacitor Cext mandatory to mitigate the harmful effects of the parasitic well capacitance as explained below in additional detail with reference to FIGS. 2A) and 2B).

權(quán)利要求

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