Transistor, semiconductor device, and electronic device
摘要
說明書
For example, the heat treatment is performed in an inert atmosphere of nitrogen, a rare gas, or the like, an oxidizing atmosphere, or an ultra-dry air atmosphere (the moisture amount is 20 ppm (?55° C. by conversion into a dew point) or less, preferably 1 ppm or less, further preferably 10 ppb or less, in the case where the measurement is performed with a dew point meter in a cavity ring down laser spectroscopy (CRDS) system). Note that the “oxidizing atmosphere” refers to an atmosphere including an oxidation gas such as oxygen, ozone, or nitrogen oxide at 10 ppm or higher. The inert atmosphere refers to an atmosphere that includes the oxidation gas at lower than 10 ppm and is filled with nitrogen or a rare gas. The pressure during the heat treatment is not particularly limited; however, the heat treatment is preferably performed under a reduced pressure.
The heat treatment is performed at a temperature higher than or equal to 250° C. and lower than or equal to 650° C., preferably higher than or equal to 300° C. and lower than or equal to 500° C. The treatment time is shorter than or equal to 24 hours. Heat treatment for over 24 hours is not preferable because the productivity is reduced.
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