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Apparatus and methods for generating electromagnetic radiation

專利號(hào)
US10785858B2
公開日期
2020-09-22
申請(qǐng)人
Massachusetts Institute of Technology（US MA Cambridge）
發(fā)明人
Ido Kaminer; Liang Jie Wong; Ognjen Ilic; Yichen Shen; John Joannopoulos; Marin Soljacic
IPC分類
H05G2/00
技術(shù)領(lǐng)域
graphene,electron,in,radiation,spp,gp,electrons,can,plasmon,beam
地域： MA MA Cambridge

摘要

An apparatus includes at least one conductive layer, an electromagnetic (EM) wave source, and an electron source. The conductive layer has a thickness less than 5 nm. The electromagnetic (EM) wave source is in electromagnetic communication with the at least one conductive layer and transmits a first EM wave at a first wavelength in the at least one conductive layer so as to generate a surface plasmon polariton (SPP) field near a surface of the at least one conductive layer. The electron source propagates an electron beam at least partially in the SPP field so as to generate a second EM wave at a second wavelength less than the first wavelength.

說明書

CROSS-REFERENCES TO RELATED APPLICATIONS

This application claims priority to U.S. provisional application Ser. No. 62/111,180, filed Feb. 3, 2015, entitled “NOVEL RADIATION SOURCES FROM THE INTERACTION OF ELECTRON BEAMS WITH SURFACE PLASMON SYSTEMS,” which is hereby incorporated herein by reference in its entirety.

GOVERNMENT SUPPORT

This invention was made with Government support under Grant No. W911NF-13-D-0001 awarded by the U.S. Army Research Office. The Government has certain rights in the invention.

BACKGROUND

X-rays (photon energy between about 100 eV and about 100 keV) have applications in a wide range of areas. For example, in medicine and dentistry, X-rays are used for diagnosis of broken bones and torn ligaments, detection of breast cancer, and discovery of cavities and impacted wisdom teeth. Computerized axial tomography (CAT) also uses X-rays produce cross-sectional pictures of a part of the body by sending a narrow beam of X-rays through the region of interest from many different angles and reconstructing the cross-sectional picture using computers. X-rays can also be used in elemental analysis, in which measurement of X-rays that pass through a sample allow a determination of the elements present in the sample. In business and industry, X-ray pictures of machines can be used to detect defects in a nondestructive manner. Similarly, pipelines for oil or natural gas can be examined for cracks or defective welds using X-ray photography. In the electronics industry, X-ray lithography is used to manufacture high density (micro- or even nano-scale) integrated circuits due to their short wavelengths (e.g., 0.01 nm to about 10 nm).

權(quán)利要求

1
The invention claimed is:1. An apparatus comprising:at least one conductive layer having a thickness less than 5 nm;an electromagnetic (EM) wave source, in electromagnetic communication with the at least one conductive layer, to transmit a first EM wave at a first wavelength in the at least one conductive layer so as to generate a surface plasmon polariton (SPP) field near a surface of the at least one conductive layer; andan electron source to propagate an electron beam at least partially in the SPP field so as to generate a second EM wave at a second wavelength different than the first wavelength, wherein the electron beam has an electron energy greater than 3 eV and the second wavelength is less than 1 μm.2. The apparatus of claim 1, wherein the at least one conductive layer comprises a two-dimensional conductor.3. The apparatus of claim 1, wherein the at least one conductive layer comprises at least one graphene layer.4. The apparatus of claim 1, wherein the at least one conductive layer defines a grating pattern to reduce propagation loss of the SPP field.5. The apparatus of claim 1, further comprising:a dielectric layer, disposed on the at least one conductive layer, to support the at least one conductive layer.6. The apparatus of claim 1, wherein the electron source is configured to provide the electron beam as a plurality of electron bunches and the EM wave source is configured to provide a plurality of laser pulses.7. The apparatus of claim 1, wherein the electron source is configured to provide the electron beam as a sheet electron beam.8. The apparatus of claim 1, wherein the electron energy is greater than 100 keV and the second wavelength is less than 2.5 nm.9. The apparatus of claim 1, wherein the electron energy is greater than 5 keV and the second wavelength is less than 100 nm.10. The apparatus of claim 1, wherein the electron energy is in a range of 0.5 keV to 200 keV and the second wavelength is 10 nm to 100 nm.11. The apparatus of claim 1, wherein the electron source comprises:a first electrode disposed at a first end of the at least one conductive layer; anda second electrode, disposed at a second end of the at least one conductive layer, to generate the electron beam via discharge, wherein the electron beam propagates substantially parallel to the surface of the at least one conductive layer.12. The apparatus of claim 1, wherein the second wavelength is less than the first wavelength.13. The apparatus of claim 1, wherein the second wavelength is greater than the first wavelength.14. The apparatus of claim 1, wherein the electron source is a free electron source and the electron beam comprises free electrons.15. The apparatus of claim 1, wherein the EM wave source is a laser, the first wavelength is an optical wavelength, and the second wavelength is an X-ray or ultraviolet wavelength.16. The apparatus of claim 1, wherein the SPP field is within 100 nm of the surface of the at least one conductive layer and the electron beam propagates within the SPP field above the surface of the at least one conductive layer.17. The apparatus of claim 1, wherein the SPP field extends across the surface of the at least one conductive layer.18. The apparatus of claim 1, wherein the electron source emits the electron beam at an angle with respect to the surface of the at least one conductive layer.19. The apparatus of claim 3, wherein the at least one graphene layer comprises:a first graphene layer;a second graphene layer disposed opposite a dielectric layer from the first graphene layer, the first graphene layer and the second graphene layer defining a cavity to support propagation of the electron beam.20. The apparatus of claim 3, wherein the at least one graphene layer comprises at least one of a bilayer graphene or a multilayer graphene.21. The apparatus of claim 19, wherein the cavity has a width of less than 100 nm.22. A method of generating electromagnetic (EM) radiation, the method comprising:illuminating a conductive layer, having a thickness less than 5 nm, with a first EM wave at a first wavelength so as to generate a surface plasmon polariton (SPP) field near a surface of the conductive layer; andpropagating an electron beam at least partially in the SPP field so as to generate a second EM wave at a second wavelength different from the first wavelength, wherein propagating the electron beam comprises propagating electrons at an electron energy greater than 3 eV and the second wavelength is less than 1 μm.23. The method of claim 22, wherein electron energy greater than 100 keV and the second wavelength is less than 2.5 nm.24. The method of claim 22, wherein electron energy greater than 5 keV and the second wavelength is less than 100 nm.25. The method of claim 22, wherein propagating the electron beam comprises propagating a plurality of electron bunches in the SPP field and wherein the second EM wave comprises coherent EM radiation.26. The method of claim 22, wherein propagating the electron beam comprises propagating the electron beam as a sheet electron beam at least partially within the SPP field.27. The method of claim 22, wherein illuminating the conductive layer comprises illuminating a graphene layer, wherein the method further comprises:adjusting a Fermi level of the graphene layer so as to modulate the second wavelength of the second EM wave.28. The method of claim 22, wherein the second wavelength is greater than the first wavelength.29. An apparatus to generate X-ray radiation, the apparatus comprising:a dielectric layer;a graphene layer doped with a surface carrier density substantially equal to or greater than 1.5×1013 cm?2 and disposed on the dielectric layer;a laser, in optical communication with the graphene layer, to transmit a laser beam, at a first wavelength substantially equal to or greater than 800 nm, in the graphene layer so as to generate a surface polariton field near a surface of the graphene layer; andan electron source to propagate an electron beam, having an electron energy greater than 100 keV, at least partially in the surface polariton field so as to generate the X-ray radiation at a second wavelength less than 5 nm.30. An apparatus comprising:at least one conductive layer having a thickness less than 5 nm;an electromagnetic (EM) wave source, in electromagnetic communication with the at least one conductive layer, to transmit a first EM wave at a first wavelength in the at least one conductive layer so as to generate a surface plasmon polariton (SPP) field in the at least one conductive layer; andan electron source to propagate an electron beam in the at least one conductive layer so as to generate a second EM wave at a second wavelength different from the first wavelength, wherein the electron beam has an electron energy greater than 3 eV and the second wavelength is less than 1 μm.31. The apparatus of claim 30, wherein the at least one conductive layer comprises a two-dimensional (2D) conductor.32. The apparatus of claim 30, wherein the at least one conductive layer comprises at least one graphene layer.33. The apparatus of claim 30, wherein the at least one conductive layer defines a grating pattern so as to reduce propagation loss of the SPP field.34. The apparatus of claim 30, further comprising:a dielectric layer, disposed on the at least one conductive layer, to support the at least one conductive layer.35. The apparatus of claim 30, wherein the electron source is configured to provide the electron beam as a plurality of electron bunches.36. The apparatus of claim 30, wherein the electron source is configured to provide the electron beam as a sheet electron beam.37. The apparatus of claim 30, wherein the electron energy is greater than 100 keV and the second wavelength is less than 2.5 nm.38. The apparatus of claim 30, wherein the electron energy is greater than 5 keV and the second wavelength is less than 100 nm.39. The apparatus of claim 30, wherein the electron energy is in a range of 0.5 keV to 200 keV and the second wavelength is 10 nm to 100 nm.40. The apparatus of claim 30, wherein the electron source comprises:a first electrode disposed at a first end of the at least one conductive layer; anda second electrode, disposed at a second end of the at least one conductive layer, to generate the electron beam via discharge, wherein the electron beam propagates substantially parallel to the surface of the at least one conductive layer.41. The apparatus of claim 32, wherein the at least one graphene layer comprises at least one of a bilayer graphene or a multilayer graphene.42. The apparatus of claim 30, wherein the second wavelength is greater than the first wavelength.
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