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Apparatus and methods for generating electromagnetic radiation

專利號(hào)
US10785858B2
公開日期
2020-09-22
申請(qǐng)人
Massachusetts Institute of Technology(US MA Cambridge)
發(fā)明人
Ido Kaminer; Liang Jie Wong; Ognjen Ilic; Yichen Shen; John Joannopoulos; Marin Soljacic
IPC分類
H05G2/00
技術(shù)領(lǐng)域
graphene,electron,in,radiation,spp,gp,electrons,can,plasmon,beam
地域: MA MA Cambridge

摘要

An apparatus includes at least one conductive layer, an electromagnetic (EM) wave source, and an electron source. The conductive layer has a thickness less than 5 nm. The electromagnetic (EM) wave source is in electromagnetic communication with the at least one conductive layer and transmits a first EM wave at a first wavelength in the at least one conductive layer so as to generate a surface plasmon polariton (SPP) field near a surface of the at least one conductive layer. The electron source propagates an electron beam at least partially in the SPP field so as to generate a second EM wave at a second wavelength less than the first wavelength.

說明書

ω ph ± = ω ± 1 - β ? ? cos ? ? θ ( 26 )
where ω±0(1±nβ) and ω0 is the central angular frequency of the driving laser. In Equation (26), ωph+ is due to electron interaction with the counter-propagating GP, whereas ωph? is due to interaction with the co-propagating GP. Note that the rightmost expression in Equation (1) reduces to ωph+ph?) when θi=π (θi=0).

The spectrum of the emitted radiation as a function of its frequency ω, azimuthal angle ? and polar angle θ, making the assumption of high confinement factors n>>1 to achieve a completely analytical result:

d 2 ? I

權(quán)利要求

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