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Apparatus and methods for generating electromagnetic radiation

專利號
US10785858B2
公開日期
2020-09-22
申請人
Massachusetts Institute of Technology(US MA Cambridge)
發(fā)明人
Ido Kaminer; Liang Jie Wong; Ognjen Ilic; Yichen Shen; John Joannopoulos; Marin Soljacic
IPC分類
H05G2/00
技術(shù)領(lǐng)域
graphene,electron,in,radiation,spp,gp,electrons,can,plasmon,beam
地域: MA MA Cambridge

摘要

An apparatus includes at least one conductive layer, an electromagnetic (EM) wave source, and an electron source. The conductive layer has a thickness less than 5 nm. The electromagnetic (EM) wave source is in electromagnetic communication with the at least one conductive layer and transmits a first EM wave at a first wavelength in the at least one conductive layer so as to generate a surface plasmon polariton (SPP) field near a surface of the at least one conductive layer. The electron source propagates an electron beam at least partially in the SPP field so as to generate a second EM wave at a second wavelength less than the first wavelength.

說明書

The inequalities can be satisfied in two spectral windows simultaneously for the same charge carrier, due to the frequency dependence of the GP phase velocity (shown by the intersection of the red curve with the blue regime in FIG. 29D). Moreover, part of the radiation (or even most of it, as in FIGS. 29A-29D) can be emitted backward, which is considered impossible for ?E in conventional materials.

權(quán)利要求

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