Apparatus and methods for generating electromagnetic radiation
摘要
說明書
In another example, a method of generating electromagnetic (EM) radiation includes illuminating a conductive layer, having a thickness less than 5 nm, with a first EM wave at a first wavelength so as to generate a surface plasmon polariton (SPP) field near a surface of the conductive layer. The method also includes propagating an electron beam at least partially in the SPP field so as to generate a second EM wave at a second wavelength less than the first wavelength.
In yet another example, an apparatus to generate X-ray radiation includes a dielectric layer and a graphene layer doped with a surface carrier density substantially equal to or greater than 1.5×1013 cm?2 and disposed on the dielectric layer. The apparatus also includes a laser, in optical communication with the graphene layer, to transmit a laser beam, at a first wavelength substantially equal to or greater than 800 nm, in the graphene layer so as to generate a surface plasmon polariton (SPP) field near a surface of the graphene layer. An electron source propagates an electron beam, having an electron energy greater than 100 keV, at least partially in the SPP field so as to generate the X-ray radiation at a second wavelength less than 2.5 nm.
In yet another example, an apparatus includes at least one conductive layer having a thickness less than 5 nm. An electromagnetic (EM) wave source is in electromagnetic communication with the at least one conductive layer to transmit a first EM wave at a first wavelength in the at least one conductive layer so as to generate a surface plasmon polariton (SPP) field in the at least one conductive layer. An electron source is operably coupled to the at least one conductive layer to propagate an electron beam in the at least one conductive layer so as to generate a second EM wave at a second wavelength less than the first wavelength.
