At least one of the plurality of through holes 111 is disposed in the second sub-pixel region 2, and the through hole 111 may be located at a central position of the second sub-pixel region 2 and may be offset in any direction according to the actual requirements. A ratio of an area of an orthographic projection of the through hole 111 on the substrate 10 to an area of an orthographic projection of the second sub-pixel region 2 on the substrate 10 is about 50%, in which “50%” is not an absolute value, however, an error of about +?10% is allowed. That is, in other embodiments, the ratio of the area of the orthographic projection of the through hole 111 on the substrate 10 to the area of the orthographic projection of the second sub-pixel region 2 on the substrate 10 may be in the range of 45% to 55%. In present disclosure, by providing the through hole 111 in the second sub-pixel region 2, i.e., in the region where the sub-pixel is located, the area of the through hole 111 may be conveniently increased to ensure the light detection unit 4 to receive more light, thereby improving detection accuracy. Moreover, the plurality of second sub-pixel regions and the plurality of through holes is in one-to-one correspondence which means each of the plurality of through holes 111 is disposed in the each of the plurality of second sub-pixel regions.