A magnetic tape was obtained in a similar manner to Example 7 except that the coating thickness of the paint for recording layer formation was changed such that the average thickness tm of the recording layer was 40 nm.
(SUL Deposition Step)
First, under the following deposition conditions, a CoZrNb layer (SUL) of 10 nm in average thickness was formed on the surface of a long polymer film as a non-magnetic support. Note that a PEN film was used as the polymer film.
Deposition method: DC magnetron sputtering method
Target: CoZrNb target
Gas species: Ar
Gas pressure: 0.1 Pa
(Deposition Step for First Seed Layer)
Next, a TiCr layer (first seed layer) of 5 nm in average thickness was deposited on the CoZrNb layer under the following deposition conditions.
Sputtering method: DC magnetron sputtering method
Target: TiCr target
Ultimate vacuum: 5×10?5 Pa
Gas species: Ar
Gas pressure: 0.5 Pa
(Deposition Step for Second Seed Layer)
Next, a NiW layer (second seed layer) of 10 nm in average thickness was deposited on the TiCr layer under the following deposition conditions.
Sputtering method: DC magnetron sputtering method
Target: NiW target
Ultimate vacuum: 5×10?5 Pa
Gas species: Ar
Gas pressure: 0.5 Pa
(Deposition Step for First Base Layer)