The deposition chamber 121 is connected to a vacuum pump, not shown, through an exhaust port 126, and the atmosphere in the deposition chamber 121 is set by the vacuum pump to a predetermined degree of vacuum. The drum 122 that has a rotatable configuration, the supply reel 124, and the take-up reel 125 are disposed inside the deposition chamber 121. Inside the deposition chamber 121, the plurality of guide rolls 127a to 127c for guiding the transfer of the substrate 111 between the supply reel 124 and the drum 122 is provided, and the plurality of guide rolls 128a to 128c for guiding the transfer of the substrate 111 between the drum 122 and the take-up reel 125 is provided. At the time of sputtering, the substrate 111 unwound from the supply reel 124 is wound around the take-up reel 125 via the guide rolls 127a to 127c, the drum 122, and the guide rolls 128a to 128c. The drum 122 has a cylindrical shape, and the elongated substrate 111 is transferred along the peripheral cylindrical surface of the drum 122. The drum 122 is provided with a cooling mechanism, not shown, and cooled to, for example, about ?20° C. at the time of sputtering. Inside the deposition chamber 121, the plurality of cathodes 123a to 123f is disposed to face the peripheral surface of the drum 122. Targets are set for these cathodes 123a to 123f, respectively. Specifically, the targets for depositing the SUL 112, the first seed layer 113A, the second seed layer 113B, the first base layer 114A, the second base layer 114B, and the recording layer 115 are respectively set for cathodes 123a, 123b, 123c, 123d, 123e, and 123f. With these cathodes 123a to 123f, the multiple kinds of films, that is, the SUL 112, the first seed layer 113A, the second seed layer 113B, the first base layer 114A, the second base layer 114B, and the recording layer 115 are simultaneously deposited.