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E-beam apparatus

專(zhuān)利號(hào)
US10867770B2
公開(kāi)日期
2020-12-15
申請(qǐng)人
ASML Netherlands B.V.（NL Veldhoven）
發(fā)明人
Peter Paul Hempenius; Sven Antoin Johan Hol; Maarten Frans Janus Kremers; Henricus Martinus Johannes Van De Groes; Niels Johannes Maria Bosch; Marcel Koenraad Marie Baggen
IPC分類(lèi)
H01J37/20; H01J37/09; H01J37/317
技術(shù)領(lǐng)域
shield,stroke,beam,electron,magnetic,stage,optics,object,table,stray
地域： AH Veldhoven

摘要

An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

說(shuō)明書(shū)

In order for the object table 520 to be connected to the positioning device 510, the object table 520 is mounted to the positioning device 510 by means of connecting structures 521 extending through through holes 541 in the magnetic shield 540. In the example described above where the magnetic shield 540 is connected to the movable part of the long stroke stage 511, the connecting structures 521 may extend between the object table 520 and the short stroke stage 512. The movable magnetic shield may be arranged between the long stroke stage 511 and short stroke stage 512 on the one hand and the object table 520 and the electron optics system 500 on the other hand, thus shielding the propagation path of the e-beam from stray fields of the long stroke actuators 513 and short stroke actuators. Thus, a part of the short stroke stage 512 that is moved by the short stroke stage actuator as well as the object table 520 may be arranged at a side of the electron optics system 500

權(quán)利要求

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