E-beam apparatus
摘要
說明書
It is an object of the present disclosure to provide an e-beam inspection tool that enables a high accuracy at a high throughput.
According to an aspect of the present disclosure, there is provided an e-beam apparatus comprising:
an electron optics system configured to project an e-beam onto an object,
an object table to hold the object,
a positioning device configured to move the object table relative to the electron optics system, the positioning device comprising a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system, wherein the e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device.
According to an aspect of the present disclosure, there is provided an e-beam apparatus according to any of the preceding aspects, wherein the e-beam apparatus is a scanning electron microscope, an electron beam direct writer, an electron beam projection lithography apparatus, an electron beam inspection apparatus, an electron beam defect verification apparatus, or an electron beam metrology apparatus.
The embodiments of the present disclosure will be readily understood by the following detailed description in conjunction with the accompanying drawings, wherein like reference numerals designate like structural elements.
