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E-beam apparatus

專利號(hào)
US10867770B2
公開(kāi)日期
2020-12-15
申請(qǐng)人
ASML Netherlands B.V.(NL Veldhoven)
發(fā)明人
Peter Paul Hempenius; Sven Antoin Johan Hol; Maarten Frans Janus Kremers; Henricus Martinus Johannes Van De Groes; Niels Johannes Maria Bosch; Marcel Koenraad Marie Baggen
IPC分類(lèi)
H01J37/20; H01J37/09; H01J37/317
技術(shù)領(lǐng)域
shield,stroke,beam,electron,magnetic,stage,optics,object,table,stray
地域: AH Veldhoven

摘要

An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

說(shuō)明書(shū)

The movable magnetic shield 660 is connected to the positioning device 610 to be moved by the positioning device 610, thus to provide that the movable magnetic shield 660 may be held in proximity of the static magnetic shield 640, in particular in proximity of the through hole in the static magnetic shield 640. The object table 620 is mounted to the positioning device 610 by means of connecting structures 621 extending through through holes 661 in the movable magnetic shield 660, thus providing that the movable magnetic shield 660 shields the actuators of the positioning device as the actuators of the positioning device are arranged below the movable magnetic shield 660 while the object table 620 is arranged above the movable magnetic shield 660. Similarly as described with reference to the long stroke stage 611—short stroke stage 612 arrangement of FIG. 5, the movable magnetic shield 660 may be connected to the long stroke stage 611 to be moved by the long stroke stage of the long stroke stage 611—short stroke stage 612 arrangement in FIG. 6, thus to position the movable magnetic shield 660 to follow a coarse movement of the object table 620, without providing a load by the shield onto the possibly more accurate, more fast short stroke stage 612. The movable magnetic shield 660 may be arranged between the long stroke actuator 613 and short stroke actuator on the one hand and the object table 620 and the electron optics system 600 on the other hand, thus shielding the propagation path of the e-beam from stray fields of the long stroke and short stroke actuators.

權(quán)利要求

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