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E-beam apparatus

專利號
US10867770B2
公開日期
2020-12-15
申請人
ASML Netherlands B.V.(NL Veldhoven)
發(fā)明人
Peter Paul Hempenius; Sven Antoin Johan Hol; Maarten Frans Janus Kremers; Henricus Martinus Johannes Van De Groes; Niels Johannes Maria Bosch; Marcel Koenraad Marie Baggen
IPC分類
H01J37/20; H01J37/09; H01J37/317
技術領域
shield,stroke,beam,electron,magnetic,stage,optics,object,table,stray
地域: AH Veldhoven

摘要

An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

說明書

Furthermore, both in the example of FIG. 5 as well as the example of FIG. 6, a long stroke stage 511, 611—short stroke stage 512, 612 arrangement is applied. The positioning device 510, 610 comprises the short stroke stage 512, 612 to position the object table 520, 620 and the long stroke stage 511, 611 to position the short stroke stage 512, 612 and the object table 520, 620. The long stroke stage 511, 611 will generally be a higher power stage as compared to the short stroke stage 512, 612. Accordingly, a magnitude of a stray field by the long stroke stage 511, 611 may exceed a magnitude of a stray field by the short stroke stage 512, 612. In order to further reduce n effect of stray fields, the long stroke stage 511, 611 is arranged at a relatively large distance from the object table 520, 620. Accordingly, the long stroke stage 511, 611 comprises dual long stroke stage actuators 513, 613, the dual long stroke stage actuators 513, 613 being arranged spaced apart on either side of the short stroke stage 512, 612. The long stroke stage actuators 513, 613 are spaced apart seen in a direction parallel to a surface of the object that is to be inspected, i.e. in a direction parallel to a main plane of movement of the positioning device 510, 610, i.e. in the present example in a horizontal direction. The positioning device 510, 610 further comprises connecting structures 514, 614 connecting long stroke stage actuators 513, 613 to the long stroke carrier 511, 611 which holds the short stroke 512, 612. The connecting structures 514, 614 extend in the direction parallel to the main plane of movement of the positioning device 510, 610.

權利要求

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