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E-beam apparatus

專利號(hào)
US10867770B2
公開日期
2020-12-15
申請(qǐng)人
ASML Netherlands B.V.(NL Veldhoven)
發(fā)明人
Peter Paul Hempenius; Sven Antoin Johan Hol; Maarten Frans Janus Kremers; Henricus Martinus Johannes Van De Groes; Niels Johannes Maria Bosch; Marcel Koenraad Marie Baggen
IPC分類
H01J37/20; H01J37/09; H01J37/317
技術(shù)領(lǐng)域
shield,stroke,beam,electron,magnetic,stage,optics,object,table,stray
地域: AH Veldhoven

摘要

An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

說(shuō)明書

FIG. 9 depicts an electron optics system 900, a positioning device 910 to position the object held by the object table 920 relative to the electron optics system 900, an object table 920 to hold the object. The positioning device 910 comprises the short stroke stage 912 to position the object table 920 and the long stroke stage 911 to position the short stroke stage 912 and the object table 920. A mechanical gravity compensator 930 is provided. The mechanical gravity compensator 930 may comprise a spring, such as one of more coil springs. The coil springs may be provided with an equal number of windings in opposite directions, e.g., in clockwise and in counter clockwise directions to at least reduce spring torsion under suppression of the spring, thus to avoid a disturbance force by torsion onto the positioning device 910, which could influence a positioning accuracy of the positioning device 910. Alternatively, other non-magnetic gravity compensators may be provided, such as a pneumatic gravity compensator or a shielded magnetic gravity compensator.

In case the positioning device 910 comprises the short stroke stage 912 to position the object table and the long stroke stage 911 to position the short stroke stage 912 and the object table 920, the gravity compensator 930 may be comprised in, e.g. integrated in, the short stroke stage 912, thus to provide a compact configuration whereby the gravity compensator 930 acts on the mass to be compensated with a short force path.

權(quán)利要求

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