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E-beam apparatus

專利號
US10867770B2
公開日期
2020-12-15
申請人
ASML Netherlands B.V.（NL Veldhoven）
發(fā)明人
Peter Paul Hempenius; Sven Antoin Johan Hol; Maarten Frans Janus Kremers; Henricus Martinus Johannes Van De Groes; Niels Johannes Maria Bosch; Marcel Koenraad Marie Baggen
IPC分類
H01J37/20; H01J37/09; H01J37/317
技術(shù)領(lǐng)域
shield,stroke,beam,electron,magnetic,stage,optics,object,table,stray
地域： AH Veldhoven

摘要

An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

說明書

  • 11. The e-beam apparatus according to any of clauses 6 to 10, wherein a length of the movable magnetic shield extends along at least a field of view of the electron optics system and a range of movement of the positioning device.
  • 12. The e-beam apparatus according to clause 1, wherein the magnetic shield comprises a static magnetic shield which is static relative to the electron optics system.
  • 13. The e-beam apparatus according to clause 12, wherein a length of the static magnetic shield extends along at least a field of view of the electron optics system.
  • 14. The e-beam apparatus according to clause 12 or 13, wherein the static magnetic shield is provided with a through hole, a propagation path of the e-beam passing through the through hole.
  • 15. The e-beam apparatus according to any of clauses 12 to 14, wherein the magnetic shield comprises a further magnetic shield.
  • 16. The e-beam apparatus according to clause 15, wherein the further magnetic shield faces the through hole in the static magnetic shield.
  • 17. The e-beam apparatus according to clause 15 or 16, wherein the further magnetic shield is the movable magnetic shield according to any of clauses 5 to 11.
  • 18. The e-beam apparatus according to any of the preceding clauses, wherein the magnetic shield comprises a local magnetic shield configured to substantially envelop the magnetic actuator by a magnetically shielding material.
  • 19. The e-beam apparatus according to clause 18, wherein an opening is provided in the local magnetic shield.

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