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E-beam apparatus

專利號(hào)
US10867770B2
公開日期
2020-12-15
申請(qǐng)人
ASML Netherlands B.V.（NL Veldhoven）
發(fā)明人
Peter Paul Hempenius; Sven Antoin Johan Hol; Maarten Frans Janus Kremers; Henricus Martinus Johannes Van De Groes; Niels Johannes Maria Bosch; Marcel Koenraad Marie Baggen
IPC分類
H01J37/20; H01J37/09; H01J37/317
技術(shù)領(lǐng)域
shield,stroke,beam,electron,magnetic,stage,optics,object,table,stray
地域： AH Veldhoven

摘要

An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

說明書

  • wherein the positioning device comprises a short stroke stage to move the object table relative to the electron optics system and a long stroke stage to move the short stroke stage relative to the electron optics system, wherein the long stroke stage comprises dual long stroke, stage actuators, the dual long stroke stage actuators being arranged, seen in a direction parallel to a main plane of movement of the positioning device, spaced apart on either side of the short stroke stage, the positioning device further comprising connecting structures connecting the short stroke stage to the respective long stroke stage actuators, the connecting structures extending in the direction parallel to the main plane of movement of the positioning device.
  • 27. An e-beam apparatus according to any of the preceding clauses further comprising a gravity compensator to at least partly compensate a gravity force on at least one of the object table and a part of the positioning device, the gravity compensator being a non-magnetic gravity compensator or a magnetic gravity compensator shielded by a magnetic shield.
  • 28. An e-beam apparatus comprising:
  • an electron optics system configured to project an e-beam onto an object,
  • an object table to hold the object,
  • a positioning device configured to move the object table relative to the electron optics system,
  • wherein the e-beam apparatus further comprises a gravity compensator to at least partly compensate a gravity force on at least one of the object table and a part of the positioning device, the gravity compensator being a non-magnetic gravity compensator or a magnetic gravity compensator shielded by a magnetic shield.

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