wherein the positioning device comprises a short stroke stage to position the object table and a long stroke stage to position the short stroke stage and the object table,
        wherein the e-beam apparatus further comprises a position sensor to measure a relative distance between the short stroke stage and the long stroke stage, or between the short stroke stage and the object table, the position sensor being a non-magnetic position sensor or a magnetic position sensor shielded by a magnetic shield.
        34. An e-beam apparatus according to any of the preceding clauses, wherein the e-beam apparatus is a scanning electron microscope, an electron beam direct writer, an electron beam projection lithography apparatus, an electron beam inspection apparatus, an electron beam defect verification apparatus, or an electron beam metrology apparatus.
    
    
As used herein, unless specifically stated otherwise, the term “or” encompasses all possible combinations, except where infeasible. For example, if it is stated that a component may include A or B, then, unless specifically stated otherwise or infeasible, the component may include A, or B, or A and B. As a second example, if it is stated that a component may include A, B, or C, then, unless specifically stated otherwise or infeasible, the component may include A, or B, or C, or A and B, or A and C, or B and C, or A and B and C.