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Electrospray ionization interface to high pressure mass spectrometry and related methods

專利號(hào)
US10867781B2
公開(kāi)日期
2020-12-15
申請(qǐng)人
The University of North Carolina at Chapel Hill(US NC Chapel Hill)
發(fā)明人
John Michael Ramsey; William McKay Gilliland, Jr.
IPC分類
H01J49/16; H01J49/24; H01J49/00; H01J49/04; B01L3/00
技術(shù)領(lǐng)域
mass,esi,analyzer,about,mm,inlet,chamber,ion,vacuum,trap
地域: NC NC Chapel Hill

摘要

An electrospray ionization (ESI)-mass spectrometer analysis systems include an ESI device with at least one emitter configured to electrospray ions and a mass spectrometer in fluid communication with the at least one emitter of the ESI device. The mass spectrometer includes a mass analyzer held in a vacuum chamber. The vacuum chamber is configured to have a high (background/gas) pressure of about 50 mTorr or greater during operation. During operation, the ESI device is configured to either; (a) electrospray ions into a spatial region external to the vacuum chamber and at atmospheric pressure, the spatial extent being adjacent to an inlet device attached to the vacuum chamber, the inlet device intakes the electrosprayed ions external to the vacuum chamber with the mass analyzer and discharges the ions into the vacuum chamber with the mass analyzer; or (b) electrospray ions directly into the vacuum chamber with the mass analyzer.

說(shuō)明書

As shown in FIGS. 10A and 10B, the analysis system 100 can include a spectrometer 10 with a function generator 82 to provide a low voltage axial RF input 82i to the mass analyzer (e.g., ion trap) 30 during mass scan for resonance ejection. The low voltage axial RF can be between about 100 mVpp to about 12,000 mVpp, typically between 100 to 10,000 mVpp. The axial RF can be applied to an end cap 31 or 32, typically end cap 31, or between the two end caps 31 and 32 during a mass scan for facilitating resonance ejection. An RF power source 88 provides an input signal to the ring electrode 33. The RF source 88 can include an RF signal generator 88g, RF amplifier 88p, and RF power amplifier 88a. The controller 100c can have a control circuit with an optional RF monitor. Some or all of these components can be held on a circuit board in the housing 10h enclosing the mass analyzer 30 in the chamber 12. In some embodiments, an amplitude ramp waveform can be provided as an input to the RF signal generator to modulate the RF amplitude. The low voltage RF can be amplified by a RF preamplifier then a power amplifier to produce a desired RF signal. The RF signal can be between about 1 MHz to 10 GHz or 1 MHz to 1000 MHz, depending on the size of the ring electrode features. As is well known to those of skill in the art, the RF frequency depends reciprocally on the ring electrode radius, r0. A typical RF frequency for an r0 of 500 μm would be 5-20 MHz. The voltages can be between 50 V0p to about 1500 V0p, typically up to about 500 V0p (as is well known to those of skill the “0p” subscript refers to zero-to-half peak).

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