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Silicon carbide semiconductor device and a method of manufacturing the silicon carbide semiconductor device

專利號
US10868122B2
公開日期
2020-12-15
申請人
FUJI ELECTRIC CO., LTD.(JP Kawasaki)
發(fā)明人
Takeshi Tawara; Koji Nakayama; Yoshiyuki Yonezawa; Hidekazu Tsuchida; Koichi Murata
IPC分類
H01L29/16; H01L29/868; H01L29/66
技術領域
layer,type,drift,lifetime,epitaxial,carbide,silicon,vanadium,region,in
地域: Kawasaki

摘要

During epitaxial growth of an n?-type drift layer having a uniform nitrogen concentration, vanadium is doped in addition to the nitrogen, whereby an n?-type lifetime reduced layer is selectively formed in the n?-type drift layer. The n?-type lifetime reduced layer is disposed at a depth that is more than 5 μm from a pn junction surface between a p-type anode layer and the n?-type drift layer in a direction toward a cathode side, and the n?-type lifetime reduced layer is disposed separated from the pn junction surface. Further, the n?-type lifetime reduced layer is disposed in a range from the pn junction surface to a depth that is ? times a thickness of the n?-type drift layer. A vanadium concentration of the n?-type lifetime reduced layer is 1/100 to ? of a nitrogen concentration of the n?-type lifetime reduced layer.

說明書

FIG. 4 is a diagram schematically depicting measured depths (CV measured depths) of doping concentrations. FIG. 4 depicts an example in which no n-type buffer layer is provided. Reference numeral 11′ is an interface between the n-type starting substrate 1 and the n?-type drift layer 3. In FIG. 4, parts identical to those in FIG. 1 are given the same reference numerals used in FIG. 1. FIG. 5 is a characteristics diagram depicting depth distribution of the n-type doping concentration of the n?-type drift layer measured by CV measurement. In FIG. 5, depth [μm] in the n?-type drift layer 3 from the pn junction surface 12 between the p-type anode layer 4 and the n?-type drift layer 3 (=0 μm) toward the n-type cathode layer (the n-type starting substrate 1) is shown on a horizontal axis. Further, in FIG. 5, the n-type doping concentration [/cm3] of the n?-type drift layer 3 is shown on a vertical axis.

權利要求

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