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Silicon carbide semiconductor device and a method of manufacturing the silicon carbide semiconductor device

專利號(hào)
US10868122B2
公開日期
2020-12-15
申請(qǐng)人
FUJI ELECTRIC CO., LTD.(JP Kawasaki)
發(fā)明人
Takeshi Tawara; Koji Nakayama; Yoshiyuki Yonezawa; Hidekazu Tsuchida; Koichi Murata
IPC分類
H01L29/16; H01L29/868; H01L29/66
技術(shù)領(lǐng)域
layer,type,drift,lifetime,epitaxial,carbide,silicon,vanadium,region,in
地域: Kawasaki

摘要

During epitaxial growth of an n?-type drift layer having a uniform nitrogen concentration, vanadium is doped in addition to the nitrogen, whereby an n?-type lifetime reduced layer is selectively formed in the n?-type drift layer. The n?-type lifetime reduced layer is disposed at a depth that is more than 5 μm from a pn junction surface between a p-type anode layer and the n?-type drift layer in a direction toward a cathode side, and the n?-type lifetime reduced layer is disposed separated from the pn junction surface. Further, the n?-type lifetime reduced layer is disposed in a range from the pn junction surface to a depth that is ? times a thickness of the n?-type drift layer. A vanadium concentration of the n?-type lifetime reduced layer is 1/100 to ? of a nitrogen concentration of the n?-type lifetime reduced layer.

說明書

In particular, in the n?-type drift layer 3, a portion (hereinafter, concentration compensated region) in which the n-type doping concentration is compensated in a decreasing direction by vanadium is the n?-type lifetime reduced layer 22. Therefore, as depicted in FIG. 4, the depth distribution of the n-type doping concentration of the n?-type drift layer 3 that extends to a predetermined depth in a direction from the pn junction surface 12 between the p-type anode layer 4 and the n?-type drift layer 3 toward the cathode side (direction indicated by arrow) is measured by CV measurement. By this CV measurement, as depicted in FIG. 5, in the n?-type drift layer 3, at a position separated from the pn junction surface 12 between the p-type anode layer 4 and the n?-type drift layer 3 by the predetermined depth d11, a concentration compensated region 22′ of the n-type doping concentration by vanadium is detected.

權(quán)利要求

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