Two or more precursor compounds are alternately deposited on the surface of the inducing layer 13 repeatedly, the polarities of the precursor compounds may be different, but at least one precursor compound is a hydrophobic compound. The deposited precursor compound is attached to the surface of the inducing layer 13 to cause polymerization and obtain a layer of molecular structure having a directional alignment, thereby controlling the functional group outside the film layer is a hydrophobic functional group.

The first precursor used in the atomic layer deposition is an amino compound, and the second precursor is an aldehyde-based compound. Specifically, the first precursor is aniline, and the second precursor is terephthalaldehyde. The surface of the inducing layer 13 is alternately deposited aniline and terephthalaldehyde. The deposition of a predetermined thickness of the outer layer of the film layer is controlled a hydrophobic group, that is, the aniline is deposited for the last time, and the inducing layer 13 in which the molecular structure is aligned perpendicular to the TFT array substrate 11 is obtained. Deposition with a benzene ring-containing precursor compound provides a rigid support for the molecular structure of the film.