The manufacturing method for a wiring board according to the first embodiment includes flattening the top 212a of the insulating layer 21a and the exposed face 211b of the circuit pattern 21b (wiring layer 21c) in the second removing step ST6. Consequently, even if the core substrate 10 itself is warped like the core substrate 10 in the present embodiment, or even if the front face 10a or the rear face 10b of the core substrate 10 is uneven, flattening of the first circuit pattern layer 21 can be achieved, and consequently, the wiring board 1 can be flattened.
Further, with the manufacturing method for a wiring board according to the first embodiment, since the insulating layer 21a formed from the ABF containing silica filler is not machined by the cutting tool 31, abrasion or chipping can be suppressed from occurring with the cutting tool 31.