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High efficiency laser-sustained plasma light source

專利號
US10887974B2
公開日期
2021-01-05
申請人
KLA-Tencor Corporation(US CA Milpitas)
發(fā)明人
Matthew Derstine; Ilya Bezel; Anatoly Shchemelinin; Eugene Shifrin
IPC分類
H05G2/00; H05H1/24
技術(shù)領(lǐng)域
plasma,reflector,pump,in,assembly,or,gas,optical,pass,broadband
地域: CA CA Milpitas

摘要

A system for generating laser sustained broadband light includes a pump source configured to generate a pumping beam, a gas containment structure for containing a gas and a multi-pass optical assembly. The multi-pass optical assembly includes one or more optical elements configured to perform a plurality of passes of the pumping beam through a portion of the gas to sustain a broadband-light-emitting plasma. The one or more optical elements are arranged to collect an unabsorbed portion of the pumping beam transmitted through the plasma and direct the collected unabsorbed portion of the pumping beam back into the portion of the gas.

說明書

In one embodiment, as shown in FIG, 2F, the gas input/output ports 210, 212 may also serve as plasma ignition electrodes. For example, the system 100 may include one or more electrical feedthroughs 224. The one or more electrical feedthroughs 224 may serve to insulate metal gas input/output tubes 210, 212. Further, the gas input/output tubes 210, 212 may be electrically coupled to a high-voltage source 225 for delivering electrical energy to the gas 107 for igniting the plasma 106. In addition, the system 100 may include one or more electrical insulating sections 220 for insulating the rest of the gas circulation system 209 from the electrified gas input/output tubes 210, 212.

In another embodiment, the reflector assembly 202 is a multi-component reflector assembly. In this regard, the elliptical shell of the assembly 202 may be formed from two or more components. For example, as shown in FIG. 2F, the reflector assembly 202 may include a top portion 230 and a bottom portion 232, which when fit together form the elliptical shell of the reflector assembly 202.

權(quán)利要求

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