According to another aspect, a charged particle beam device for imaging and/or inspecting a specimen is provided. The charged particle beam device includes a charged particle beam source for generating a charged particle beam propagating along an optical axis; a beam influencing element including an electrode arrangement according to any of the embodiments described herein; an objective lens device for focusing the charged particle beam onto the specimen; and a detector for detecting signal charged particles emitted by the specimen.

In some embodiments, the charged particle beam device is an electron microscope, particularly a scanning electron microscope (SEM) with one or more scan deflectors for scanning the primary charged particle beam over a surface of the specimen.

According to one aspect, a method of reducing an electric field strength in an electrode arrangement is provided, particularly an electrode arrangement according to any of the embodiments described herein. The method includes generating a charged particle beam propagating along an optical axis; directing the charged particle beam through an electrode arrangement including at least a first electrode provided on a first electric potential, a second electrode provided on a second electric potential, and a first spacer element sandwiched between the first electrode and the second electrode for aligning the first electrode and the second electrode relative to each other; and bending electrical field lines away from a point of contact between the first electrode and the first spacer element with a first conductive shield provided in a first blind hole of the first spacer element, wherein a contact assembly protruding into the first blind hole provides an electrical contact between the first conductive shield and the first electrode.