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Method of filling recess

專利號
US11177133B2
公開日期
2021-11-16
申請人
TOKYO ELECTRON LIMITED(JP Tokyo)
發(fā)明人
Satoshi Takagi; Yoshimasa Watanabe
IPC分類
H01L21/02; H01L21/268
技術(shù)領(lǐng)域
gas,laser,film,501a,amorphous,recess,silicon,annealing,in,wafer
地域: Tokyo

摘要

A method of filling a recess according to one embodiment of the present disclosure comprises heating an amorphous semiconductor film without crystallizing the amorphous semiconductor film by radiating laser light to the amorphous semiconductor film embedded in the recess.

說明書

1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20

The opening 52 is a gas exhaust port formed so as to be capable of exhausting the gas in the inner tube 44. The length of the opening 52 is formed to be equal to the length of the wafer boat 38 or to extend upwards and downwards in the vertical direction to be longer than the length of the wafer boat 38. That is, the upper end of the opening 52 extends to be located at a height equal to or higher than a position corresponding to the upper end of the wafer boat 38, and the lower end of the opening 52 extends to be located at a height equal to or lower than a position corresponding to the lower end of the wafer boat 38. Specifically, as illustrated in FIG. 2, the distance L2 in the height direction between the upper end of the wafer boat 38 and the upper end of the opening 52 is in the range of about 0 mm to 5 mm. In addition, the distance L3 in the height direction between the lower end of the wafer boat 38 and the lower end of the opening 52 is in the range of about 0 mm to 350 mm.

The lower end of the reaction tube 34 is supported by a cylindrical manifold 54 formed of, for example, stainless steel. A flange part 56 is formed at the upper end of the manifold 54, and the lower end of the outer tube 46 is installed and supported on the flange part 56. A seal member 58 such as an O-ring is interposed between the flange part 56 and the lower end of the outer tube 46 so that the inside of the outer tube 46 is hermetically sealed.

權(quán)利要求

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