The system 601 may also be referred as a stepper or a scanner, and the photo mask 609 is also referred to as a mask, a photo mask, or a reticle. The light source 603 includes a radiation source providing the light 605, having a UV wavelength of approximately 365 nm. For example, a mercury lamp may be utilized, which is operable to provide UV wavelengths such as an I-line (365 nm) wavelength. In an illustrative embodiment, the optical lithography system 601 is an I-line stepper that is operable to produce light having a single wavelength of 365 nm.

In an embodiment the light source 603 supplies the light 605 to the second redistribution passivation layer 507, in order to induce a reaction of the PACs, which in turn reacts with the second redistribution passivation layer polymer resin to chemically alter those portions of the second redistribution passivation layer 507 to which the light 605 impinges. The patterned light impinging upon portions of the second redistribution passivation layer 507 to induces a reaction of the PACs within the second redistribution passivation layer 507. The chemical reaction products of the PACs' absorption of the patterned light (e.g., acids/bases/free radicals) then reacts with the second redistribution passivation layer polymer resin, chemically altering the second redistribution passivation layer 507 in those portions that were illuminated through the patterned mask. The condense lens 607 is configured to guide the light 605 to the photomask 609. In an illustrative embodiment, only light in the I-line wavelength is supplied by the light 605 to the second redistribution passivation layer 507 during the exposure step (in contrast to broadband light from GHI-line wavelengths, for example).