白丝美女被狂躁免费视频网站,500av导航大全精品,yw.193.cnc爆乳尤物未满,97se亚洲综合色区,аⅴ天堂中文在线网官网

Method of manufacturing a semiconductor device and a semiconductor device

專利號
US11177179B2
公開日期
2021-11-16
申請人
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.(TW Hsinchu)
發(fā)明人
Hung-Li Chiang; Chao-Ching Cheng; Chih-Liang Chen; Tzu-Chiang Chen; Ta-Pen Guo; Yu-Lin Yang; I-Sheng Chen; Szu-Wei Huang
IPC分類
H01L21/8234; H01L29/66; H01L29/06; H01L27/088; G03F1/38; H01L21/308; H01L29/423; B82Y10/00; H01L29/08; H01L29/78; H01L29/775; H01L29/417; H01L29/786; H01L27/092; H01L21/8238
技術(shù)領(lǐng)域
layer,epitaxial,fet,drain,gaa,layers,gate,dielectric,in,fin
地域: Hsinchu

摘要

In a method, a fin structure, in which first semiconductor layers and second semiconductor layers are alternately stacked, is formed. A sacrificial gate structure is formed over the fin structure. The first semiconductor layers are etched at a source/drain region of the fin structure, which is not covered by the sacrificial gate structure, thereby forming a first source/drain space in which the second semiconductor layers are exposed. A dielectric layer is formed at the first source/drain space, thereby covering the exposed second semiconductor layers. The dielectric layer and part of the second semiconductor layers are etched, thereby forming a second source/drain space. A source/drain epitaxial layer is formed in the second source/drain space. At least one of the second semiconductor layers is in contact with the source/drain epitaxial layer, and at least one of the second semiconductor layers is separated from the source/drain epitaxial layer.

說明書

As set forth above, FIG. 1 shows GAA FETs. However, the structures do not necessarily function as a transistor. In some embodiments, the structures shown in FIG. 1 can function as resistors. In such a case, the gate electrode is coupled to a fixed potential, such as Vdd (e.g., positive power supply), ? Vdd or Vss (e.g., the ground). The resistance value can be adjusted by adjusting the number of the semiconductor wires 25 contacting the source/drain epitaxial layer 40. For example, assuming that the resistance value between the source and drain is 4R when the number of the semiconductor wires 25 contacting the source/drain epitaxial layer 40 is one, the resistance values 2 R, 1.25 R and R can be obtained when the number of the semiconductor wires 25 contacting the source/drain epitaxial layer 40 is two, three and four, respectively.

權(quán)利要求

1
微信群二維碼
意見反饋