白丝美女被狂躁免费视频网站,500av导航大全精品,yw.193.cnc爆乳尤物未满,97se亚洲综合色区,аⅴ天堂中文在线网官网

Method of manufacturing a semiconductor device and a semiconductor device

專(zhuān)利號(hào)
US11177179B2
公開(kāi)日期
2021-11-16
申請(qǐng)人
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.(TW Hsinchu)
發(fā)明人
Hung-Li Chiang; Chao-Ching Cheng; Chih-Liang Chen; Tzu-Chiang Chen; Ta-Pen Guo; Yu-Lin Yang; I-Sheng Chen; Szu-Wei Huang
IPC分類(lèi)
H01L21/8234; H01L29/66; H01L29/06; H01L27/088; G03F1/38; H01L21/308; H01L29/423; B82Y10/00; H01L29/08; H01L29/78; H01L29/775; H01L29/417; H01L29/786; H01L27/092; H01L21/8238
技術(shù)領(lǐng)域
layer,epitaxial,fet,drain,gaa,layers,gate,dielectric,in,fin
地域: Hsinchu

摘要

In a method, a fin structure, in which first semiconductor layers and second semiconductor layers are alternately stacked, is formed. A sacrificial gate structure is formed over the fin structure. The first semiconductor layers are etched at a source/drain region of the fin structure, which is not covered by the sacrificial gate structure, thereby forming a first source/drain space in which the second semiconductor layers are exposed. A dielectric layer is formed at the first source/drain space, thereby covering the exposed second semiconductor layers. The dielectric layer and part of the second semiconductor layers are etched, thereby forming a second source/drain space. A source/drain epitaxial layer is formed in the second source/drain space. At least one of the second semiconductor layers is in contact with the source/drain epitaxial layer, and at least one of the second semiconductor layers is separated from the source/drain epitaxial layer.

說(shuō)明書(shū)

Further, spatially relative terms, such as “beneath,” “below,” “l(fā)ower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly. In addition, the term “being made of” may mean either “comprising” or “consisting of.” In the present disclosure, a phrase “one of A, B and C” means “A, B and/or C” (A, B, C, A and B, A and C, B and C, or A, B and C), and does not mean one element from A, one element from B and one element from C, unless otherwise described.

In a GAA FET, a driving current can be adjusted by changing dimensions (e.g., a cross sectional area) of each semiconductor wires constituting channel regions and/or by changing the number of semiconductor wires vertically arranged over a substrate. However, it is generally difficult to manufacture GAA FETs with different numbers of semiconductor wires within one semiconductor chip.

In the present disclosure, the driving current of GAA FETs is modulated by changing the number of semiconductor wires electrically connected to a source/drain epitaxial layer. In this disclosure, a source/drain refers to a source and/or a drain. It is noted that in the present disclosure, a source and a drain are interchangeably used and the structures thereof are substantially the same, unless otherwise described.

權(quán)利要求

1
微信群二維碼
意見(jiàn)反饋