A glass substrate (OA-10, made by Nippon Electric Glass Co., ITO layer thickness of 50 nm, substrate refractive index of 1.47) having an ITO film measuring 2.5 cm2 and 0.7 mm thick was put into a washing vessel and ultrasonically washed in 2-propanol, after which it was subjected to treatment with UV-ozone for 30 minutes. The following organic layers were sequentially deposited onto this transparent anode (ITO film) by a vacuum vapor deposition method:
First layer (hole injection layer): HIL-2; film thickness of 40 nm
Second layer (hole transport layer): HTL-2; film thickness of 10 nm
Third layer (light-emitting layer): BE-3 and H-3 (weight ratio of 5:95); film thickness of 30 nm
Fourth layer (first electron transport layer): ETL-1; film thickness of 30 nm
Over this, lithium fluoride was vapor-deposited in a thickness of 1 nm, followed by metallic aluminum in a thickness of 70 nm, which gave a cathode. Note that the lithium fluoride (1 nm) constitutes a layer located between the light-emitting layer and the cathode, but because it is an inorganic layer, it is not included in the thickness of the second intermediate organic layer of the present application.