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Organoelectroluminescent element, and light emission device, display device, and illumination device in which said organoelectroluminescent element is used

專(zhuān)利號(hào)
US11177450B2
公開(kāi)日期
2021-11-16
申請(qǐng)人
Naoyuki Hayashi; Hideki Yasuda; Koji Takaku(IE Dublin)
發(fā)明人
Naoyuki Hayashi; Hideki Yasuda; Koji Takaku
IPC分類(lèi)
H01L51/50; H01L51/00
技術(shù)領(lǐng)域
group,layer,atom,preferably,emitting,ligand,ring,light,nm,in
地域: Kanagawa

摘要

An organoelectroluminescent element which can satisfy both a high external quantum efficiency and high power efficiency at the same time, which has on a substrate an anode, a first intermediate organic layer composed of at least one organic layer, a light-emitting layer, a second intermediate organic layer composed of at least one organic layer, and a cathode in this order, and in which light is extracted from the aforementioned anode side, wherein the aforementioned light-emitting layer contains a light-emitting material that is oriented in the horizontal direction with the substrate, the order parameter of the aforementioned light-emitting material in the aforementioned light-emitting layer is at least 0.7, and the relationship between the thickness T1 (nm) of the aforementioned first intermediate organic layer and the thickness T2 (nm) of the aforementioned second intermediate organic layer is such that 1.1

說(shuō)明書(shū)

0.7 50 30 1.67 1.8 1.7 465 Example 9 Comparative 0.7 125 30 4.17 1.0 (reference) 1.0 (reference) 465 Example 13

Working Example 10-1

A glass substrate (OA-10, made by Nippon Electric Glass Co., ITO layer thickness of 50 nm, substrate refractive index of 1.47) having an ITO film measuring 2.5 cm2 and 0.7 mm thick was put into a washing vessel and ultrasonically washed in 2-propanol, after which it was subjected to treatment with UV-ozone for 30 minutes. The following organic layers were sequentially deposited onto this transparent anode (ITO film) by a vacuum vapor deposition method:

First layer (hole injection layer): HIL-2; film thickness of 40 nm

Second layer (hole transport layer): HTL-2; film thickness of 10 nm

Third layer (light-emitting layer): BE-3 and H-3 (weight ratio of 5:95); film thickness of 30 nm

Fourth layer (first electron transport layer): ETL-1; film thickness of 30 nm

Over this, lithium fluoride was vapor-deposited in a thickness of 1 nm, followed by metallic aluminum in a thickness of 70 nm, which gave a cathode. Note that the lithium fluoride (1 nm) constitutes a layer located between the light-emitting layer and the cathode, but because it is an inorganic layer, it is not included in the thickness of the second intermediate organic layer of the present application.

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