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Devices, structures, materials and methods for vertical light emitting transistors and light emitting displays

專利號
US11177465B2
公開日期
2021-11-16
申請人
Atom H2O, LLC(US CA Escondido)
發(fā)明人
Huaping Li
IPC分類
H01L33/00; H01L51/52; H01L51/56; H01L51/05; H01L27/15; H01L27/32; H01L33/06; H01L33/24; H01L33/28; H01L33/30; H01L33/32; H01L33/34; H01L33/40; H01L33/52; H01L51/00; H01L33/08
技術領域
nw,ag,vplets,electrode,conductive,electrodes,porous,emitting,dielectric,leps
地域: CA CA Escondido

摘要

Devices, structures, materials and methods for vertical light emitting transistors (VLETs) and light emitting displays (LEDs) are provided. In particular, architectures for vertical polymer light emitting transistors (VPLETs) for active matrix organic light emitting displays (AMOLEDs) and AMOLEDs incorporating such VPLETs are described. Porous conductive transparent electrodes (such as from nanowires (NW)) alone or in combination with conjugated light emitting polymers (LEPs) and dielectric materials are utilized in forming organic light emitting transistors (OLETs). Combinations of thin films of ionic gels, LEDs, porous conductive electrodes and relevant substrates and gates are utilized to construct LETs, including singly and doubly gated VPLETs. In addition, printing processes are utilized to deposit layers of one or more of porous conductive electrodes, LEDs, and dielectric materials on various substrates to construct LETs, including singly and doubly gated VPLETs.

說明書

TABLE 2 Performance Metrics for Ag NW Enabled VPLETs Figures of Merits Units Values Ag NW Concentration % >99 Ag NW Length pm ?>1 Ink Viscosity mPa · s <15 Ag NW Lifetime Days (free aggregation) >180? Ag NW thickness μm <10 Ag NW Printing Density Tubes/μm2 >30 Transmittance (Ag NW) % >90 Resistivity (Ag NW) Ω/sq ~30? Ink Solution Type Au UT Dots Line Width Minimum μm ?10 Alignment Error ± μm ?5 Resistivity Au Ω/sq ?~1 Dielectric Thickness μm ?10 Gate Leakage Current pA/cm2 >10 Polymer Emitter PFO/Super-yellow/MEH-

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