The first part 80a is a circular arc plate-like part that is equal to or larger than a semicircle and extends along the circumferential direction of the processing container 4 from the first partition 70 at one side to the first partition 72 at the other side. That is, the first part 80a is provided so as not to pass through the half line L that extends outward from the central axis C of the processing container 4 and passing through the temperature sensor 60.
The second part 80b is a circular arc plate-like part that is smaller than a semicircle and extends along the circumferential direction of the processing container 4 from the first partition 70 at one side to the first partition 72 at the other side. That is, the second part 80b is provided so as to pass through the half line L that extends outward from the central axis C of the processing container 4 and passing through the temperature sensor 60.
Other configurations are the same as those of the heat treatment apparatus 1 of the first embodiment.
(Effect)
Effect produced by the heat treatment apparatus 1A of the second embodiment will be described.