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Single well one transistor and one capacitor nonvolatile memory device and integration schemes

專利號
US11659709B2
公開日期
2023-05-23
申請人
GLOBALFOUNDRIES Singapore Pte. Ltd.(SG Singapore)
發(fā)明人
Xinshu Cai; Shyue Seng Tan; Juan Boon Tan; Kiok Boone Elgin Quek; Eng Huat Toh
IPC分類
H01L27/11521; H01L29/66; H01L49/02; H01L29/788; H01L29/06
技術領域
floating,gate,capacitor,112a,112b,region,first,active,110a,dielectric
地域: Singapore

摘要

A nonvolatile memory device is provided. The nonvolatile memory device comprises an active region surrounded by an isolation structure. A floating gate may be arranged over the active region, the floating gate having a first end and a second end over the isolation structure. A first doped region may be provided in the active region adjacent to a first side of the floating gate and a second doped region may be provided in the active region adjacent to a second side of the floating gate. A first capacitor may be provided over the floating gate, whereby a first electrode of the first capacitor is electrically coupled to the floating gate. A second capacitor may be provided, whereby a first electrode of the second capacitor is over the isolation structure and adjacent to the floating gate.

說明書

During a reading operation, a positive bias of approximately 2.5V may be applied to the first capacitor 168 and approximately 1V may be applied to the drain 108 of a selected nonvolatile memory transistor 188. The source 106 and the substrate terminal of the selected nonvolatile memory transistor 188 may be grounded. A current may be detected at the drain 108 depending on a threshold voltage of the selected nonvolatile memory transistor 188. For example, the threshold voltage of the selected nonvolatile memory transistor 188 is low after erase and a current may be detected at the drain 108. A program operation may lead to a high threshold voltage of the selected nonvolatile memory transistor 188 and less current or negligible current may be detected at the drain 108. The first capacitor 168, the source 106, the drain 108 and the substrate terminal of an unselected nonvolatile memory transistor 188 are grounded.

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