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Heat dissipation device for electronic component

專利號
US11744049B2
公開日期
2023-08-29
申請人
Valeo Siemens eAutomotive (Shenzhen) Co., Ltd.（CN Shenzhen）
發(fā)明人
Gongyuan Qu; Ronghui Li
IPC分類
H01L23/31; H05K7/20; H05K5/02
技術領域
potting,electrical,chamber,spacer,heat,in,element,sub,apparatus,second
地域： Shenzhen

摘要

Disclosed are an electrical apparatus, a method for manufacturing an electrical apparatus, and a motor vehicle, and the electrical apparatus. In the apparatus, a chamber includes a first electrical element located at a first position and a second electrical element located at a second position, the first electrical element and the second electrical element having different heat dissipation characteristics. The electrical apparatus further includes a potting spacer, the potting spacer separating the chamber into two sub-chambers: a first sub-chamber and a second sub-chamber. The first electrical element is located in the first sub-chamber, and the second electrical element is located in the second sub-chamber.

說明書

FIG. 3A is a top view of the potting spacer 140 mounted in the chamber 110 of the electrical apparatus 100 according to an embodiment of the present disclosure;

FIG. 3B is a sectional view of the electrical apparatus shown in FIG. 3A taken along line B-B, according to an embodiment of the present disclosure;

FIG. 4A is a stereogram of a potting spacer according to an embodiment of the present disclosure, wherein the first portion and the second portion of the potting spacer are in an open status, according to an embodiment of the present disclosure;

FIG. 4B is a side view of the potting spacer shown in FIG. 4A, according to an embodiment of the present disclosure;

FIG. 4C is a stereogram of the potting spacer shown in FIG. 4A, wherein the first portion and the second portion of the potting spacer are in a closed status, according to an embodiment of the present disclosure;

FIG. 5A is a stereogram of the chamber 110 in which a bus 150 is disposed according to an embodiment of the present disclosure;

FIG. 5B is a stereogram of the chamber 110 shown in FIG. 5A in which a potting spacer is mounted, according to an embodiment of the present disclosure;

權利要求

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