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Display apparatus having pixels around hole in substrate and touch layer overlapped with passivation layer

專利號
US11793023B2
公開日期
2023-10-17
申請人
SAMSUNG DISPLAY CO., LTD.(KR Yongin-si)
發(fā)明人
Jonghyun Choi; Kinyeng Kang; Suyeon Sim
IPC分類
H10K50/844; G04B19/12; H10K59/40; H10K71/00; G04B19/04; H10K50/842; H10K59/12; H10K59/121
技術(shù)領(lǐng)域
film,touch,insulating,may,layer,op,electrode,inorganic,formed,hole
地域: Yongin-si

摘要

A method of manufacturing a display apparatus includes providing a substrate, forming a display unit defining an opening portion in a display region over the substrate, forming a thin film encapsulation layer to seal the display unit, forming a touch electrode over the thin film encapsulation layer, forming a touch insulating film covering the touch electrode such that the thin film encapsulation layer and the touch insulating film are sequentially stacked and formed over the substrate in the opening portion, forming a touch contact hole by removing a portion of the touch insulating film to expose a portion of the touch electrode, and removing a portion of the touch insulating film and a portion of the thin film encapsulation layer formed in the opening portion to expose a portion of the substrate during the forming of the touch contact hole.

說明書

According to an embodiment, the inorganic film 310 of the thin film encapsulation layer 300 and the touch insulating film 430 formed of an inorganic material may be concurrently removed by, for example, a dry etching process. Dry etching may effectively suppress vertical erosion that may otherwise occur with wet etching. Therefore, dry etching is suitable for fine pattern etching, and an etching process may be performed by a gas system, for example, by plasma without using a chemical solution. However, the process of removing the touch insulating film 430 and the inorganic film 310 of the thin film encapsulation layer 300 is not limited thereto, and the forming of the touch contact hole TCH and the removing of the touch insulating film 430 and the inorganic film 310 in the opening portion OP may be performed by any process for removing a film formed of an inorganic material.

In the display apparatus manufacturing method according to the present embodiment, at least a portion of the touch insulating film 430 and the inorganic film 310 stacked in the opening portion OP may be removed concurrently while performing the process of forming the touch contact hole TCH.

權(quán)利要求

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