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Method for manufacturing thermal dispersion layer in programmable metallization cell

專利號(hào)
US11800823B2
公開日期
2023-10-24
申請(qǐng)人
Taiwan Semiconductor Manufacturing Co., Ltd.(TW Hsinchu)
發(fā)明人
Fa-Shen Jiang; Hsing-Lien Lin
IPC分類
H10N70/20; G11C13/00; H10N70/00
技術(shù)領(lǐng)域
electrode,layer,dielectric,conductive,sidewalls,dispersion,ild,bottom,pmcram,top
地域: Hsin-Chu

摘要

Some embodiments relate to a method for manufacturing a memory device. The method includes forming a bottom electrode over a substrate. A heat dispersion layer is formed over the bottom electrode. A dielectric layer is formed over the heat dispersion layer. A top electrode is formed over the dielectric layer. The heat dispersion layer comprises a first dielectric material.

說(shuō)明書

In some embodiments, the dielectric layer 110 has a first pair sidewalls 110a that are aligned with outer sidewalls of the bottom electrode 106. A sidewall spacer 116 surrounds the outer sidewalls of the top electrode 114, the outer sidewalls of the metal layer 112 and the second pair of outer sidewalls 110b of the dielectric layer 110. The first pair of outer sidewalls 110a has a greater width than a second pair of outer sidewalls 110b. A bottom surface of the sidewall spacer 116 contacts a top surface of the dielectric layer 110. Outer sidewalls of the top electrode via 120 are within the outer sidewalls of the top electrode 114. In some embodiments, the first conductive via 122 and the first conductive wire 124 may be comprised of copper or aluminum, for example. Outer sidewalls of the bottom electrode 106 are aligned with the first pair of outer sidewalls 110a of the dielectric layer 110. Outer sidewalls of the top electrode 114 and outer sidewalls of the metal layer 112 are aligned with the second pair of outer sidewalls 110b of the dielectric layer 110. In some embodiments, the first pair of outer sidewalls 110a and the second pair of outer sidewalls 110b are defined from a cross-sectional view. For example, if when viewed from above the programmable metallization cell 119 is circular/elliptical then the first pair of outer sidewalls 110a is a single continuous sidewall when viewed from above, therefore the first “pair” of outer sidewalls 110a refers to the nature of this single continuous sidewall when depicted in in a cross-sectional view. Additionally, if when viewed from above the programmable metallization cell 119 is circular or elliptical then any length associated with a cross-sectional view of the layers comprising the programmable metallization cell 119 respectively correspond to diameters of a circle or lengths defined between two vertices on the major axis of an ellipse.

權(quán)利要求

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