Therefore, at least the following is claimed:1. A magnetic tunnel junction (MTJ) device, comprising:a first ferromagnetic (FM) layer, where the first FM layer is a fixed FM layer consisting of a single layer of FM material having a first thickness;a gadolinium oxide (GdOX) tunnel barrier having a first side disposed on a first side of the first ferromagnetic layer, where the GdOX tunnel barrier comprises Gd2O3, and a resistance state of the MTJ device is controllable at room temperature;a first buffering layer disposed on a second side of the first FM layer opposite the GdOX tunnel barrier;a second FM layer, where the second FM layer is a free FM layer consisting of a single layer of FM material having a second thickness greater than the first thickness, the second FM layer having a first side disposed on a second side of the GdOX tunnel barrier, where the FM material of the second layer has the same material composition as the FM material of the first layer; anda second buffering layer disposed on a second side of the second FM layer opposite the GdOx tunnel barrier.2. The MTJ device of claim 1, wherein the GdOX tunnel barrier between the first and second FM layers forms a perpendicular MTJ (pMTJ).3. The MTJ device of claim 1, wherein application of a positive voltage pulse across the free and fixed layers under zero magnetic field sets the MTJ device to a non-volatile low resistance state.4. The MTJ device of claim 1, wherein application of a negative voltage pulse across the free and fixed layers under zero magnetic field sets the MTJ device to a non-volatile high resistance state.5. The MJT device of claim 4, wherein the negative voltage pulse establishes antiferromagnetic (AFM) coupling between the free and fixed layers.6. The MTJ device of claim 1, wherein a thickness of the GdOX tunnel barrier is in a range from about 1 nm to about 3.5 nm.7. The MTJ device of claim 1, wherein the first and second FM layers comprise cobalt iron boron (CoFeB).8. The MTJ device of claim 1, wherein the thickness of the first FM layer is in a range from about 0.7 nm to about 0.9 nm and the thickness of the second FM layer is in a range from about 1.5 nm to about 1.6 nm.9. A sensor comprising the MTJ device of claim 1, where the sensor detects a magnetic field.10. A memory storage system comprising the MTJ device of claim 1.11. The MTJ device of claim 1, wherein a thickness of the GdOX tunnel barrier is greater than 2 nm.