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Voltage control of SOT-MRAM for deterministic writing

專利號(hào)
US11930720B2
公開日期
2024-03-12
申請(qǐng)人
INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES(CN Beijing)
發(fā)明人
Meiyin Yang; Jun Luo; Yan Cui; Jing Xu
IPC分類
G11C11/16; G11C11/18; G11C11/22; H10B61/00; H10N52/00; H10N52/80
技術(shù)領(lǐng)域
metal,layer,electrode,magnetic,tunnel,portion,disclosure,random,film,junction
地域: Beijing

摘要

The present disclosure provides a storage unit, a data writing method and a data reading method thereof, a memory and an electronic device. The storage unit includes a semiconductor substrate, a first insulating medium layer, a ferroelectric thin film layer, a bottom electrode, a tunnel junction, a first metal interconnection portion, a second metal interconnection portion, a third metal interconnection portion and a fourth metal interconnection portion. The first insulating medium layer is formed on the semiconductor substrate, the ferroelectric thin film layer is disposed on the first insulating medium layer, the bottom electrode is formed on the ferroelectric thin film layer, and the tunnel junction is formed on the bottom electrode. The first metal interconnection portion is connected to a first end of the bottom electrode, and the third metal interconnection portion is connected to a second end of the bottom electrode. The second metal interconnection portion is connected to the ferroelectric thin film layer, and the fourth metal interconnection portion is connected to the tunnel junction. As compared with the prior art, the present disclosure can control a directional flipping of the magnetic moment in the tunnel junction based on the ferroelectric thin film layer provided. Based on the structural design of the storage unit, the present disclosure does not require an external magnetic field, and fully meets the requirement of high integration of the device.

說明書

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Writing data “0”: A positive voltage is applied from the first metal interconnection portion 601 (or the third metal interconnection portion 603) to the second metal interconnection portion 602 to vertically polarize the ferroelectric thin film layer 300. The applied positive voltage is removed, and a negative current flows from the first metal interconnection portion 601 to the third metal interconnection portion 603.

Based on the above-mentioned process of writing data “0” or “1”, it can be determined that the present disclosure can choose to apply a positive voltage or a negative voltage according to whether it is the data “1” or the data “0” is to be written, that is, the writing of SOT-MRAM is regulated by changing the positive or negative polarization of the voltage; and the present disclosure can also choose to apply a positive current or a negative current according to whether it is the data “1” or the data “0” is to be written, that is, the writing of SOT-MRAM is regulated by changing the direction of the current. Or it can be understood that the present disclosure can choose the positive or negative polarization of the applied voltage and change the direction of the current according to whether it is the data “1” or the data “0” is to be written.

Based on the same technical concept as the structure of the magnetic random access storage unit of the present disclosure, the present disclosure can also provide a data reading method for a magnetic random access storage unit. The data reading method may include, without limitation, the following at least one step. Regarding the structure of the product in FIG. 1 or FIG. 2, a repeated description will not be given herein.

權(quán)利要求

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