The interconnect structures 210c and 210d have the configuration similar to the interconnect structure 210 of FIG. 8. The conductive features 215 of the interconnect structure 210c and the interconnect structure 210d are formed in the same level. In the layout of the interconnect structures 210c and 210d, the conductive features 212 of the interconnect structures 210c and 210d are arranged in a line. Moreover, the conductive features 216 of the interconnect structure 210c are arranged in a first line, and the conductive features 216 of the interconnect structure 210d are arranged in a second line parallel with the first line. In some embodiments, a distance between the first and second lines is greater than the pitch width of the conductive features 212.