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Electrochemical energy storage devices

專利號
US11996517B2
公開日期
2024-05-28
申請人
Space Charge, LLC(US CO Aspen)
發(fā)明人
John B. Read; Daniel C. Sweeney
IPC分類
H01M10/0562; H01G11/02; H01G11/04; H01G11/20; H01G11/28; H01G11/46; H01G11/48; H01G11/70; H01M4/04; H01M4/131; H01M4/48; H01M4/525; H01M4/86; H01M10/0585; H01M8/12
技術(shù)領(lǐng)域
nm,electrode,energy,about,solid,may,storage,in,or,be
地域: CO CO Aspen

摘要

Integrated devices comprising integrated circuits and energy storage devices are described. Disclosed energy storage devices correspond to an all-solid-state construction, and do not include any gels, liquids, or other materials that are incompatible with microfabrication techniques. Disclosed energy storage device comprises energy storage cells with electrodes comprising metal-containing compositions, like metal oxides, metal nitrides, or metal hydrides, and a solid state electrolyte.

說明書

M1OX+(N?1) + O? → M1OX+N + e? M2OY?(N?1) + e? M2OY?N + O? Overall Reaction: M1OX+(N?1) + M2OY?(N?1) → M1OX+N + M2OY?N

Although not depicted in the figures, an energy storage device may optionally comprise further comprise a first current collector in electrical contact with the first electrode and a second current collector in electrical contact with the second electrode. Optionally, the first current collector and the second current collector each independently comprise a compliant porous carbon material, which may be useful for accommodate expansion and contraction of materials of the solid-state energy storage device, such as the electrodes, the electrolyte, and other materials of the solid-state energy storage device.

Optionally, a solid-state energy storage device is fabricated by means of atomic layer deposition, a form of chemical vapor deposition involving precursor chemicals and a two stage deposition process, such as where the deposition chamber must be purged between processing stages. Atomic layer deposition (ALD) permits the formation of layers having a thickness of several nanometers or less and intricate surface features of similar dimensions. Advanced magnetron sputtering may also correspond to a useful deposition technique. Multiple deposition chambers may be useful for performing sequential deposition operations.

權(quán)利要求

1
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