Because the halftone process enables the irradiated situation of different regions be different, the first pixel defining structure 31 and the second pixel defining structure 32 with the different thicknesses can be formed, and when the material is subjected to specific irradiation, a structure of functional groups on a surface of the material can be changed, so that hydrophilic and hydrophobic properties of the material are changed. Based on the above principle, the thicknesses and the hydrophilic and hydrophobic properties of the first pixel defining structure 31 and the second pixel defining structure 32 can be controlled by adjusting parameters of the halftone process.

According to the method for preparing the display substrate provided by the embodiments of the present disclosure, because the first pixel defining structure 31 and the second pixel defining structure 32 have the hydrophobicity and hydrophilcity respectively, the ink circulates in the first openings 212 advantageously and is not prone to overflowing into an adjacent pixel column opening ‘A’. The pixel defining structure 3 can be formed by one material through the halftone process, process steps are reduced, and the production cost of the display substrate is reduced advantageously.

Optionally, please with reference to FIG. 1 and FIG. 3, in the method for preparing the display substrate provided by the embodiments of the present disclosure, operation S3 includes: