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Display panel, manufacturing method thereof and display device

專利號
US12048204B2
公開日期
2024-07-23
申請人
Chengdu BOE Optoelectronics Technology Co., Ltd.; BOE TECHNOLOGY GROUP CO., LTD.(CN Sichuan CN Beijing)
發(fā)明人
Tianyi Cheng; Chi Yu; Xingliang Xiao; Zhong Lu; Benlian Wang; Yuanzheng Guo
IPC分類
H10K59/124; H10K59/122; H10K71/00
技術(shù)領(lǐng)域
region,pixel,substrate,layer,display,in,second,density,located,light
地域: Chengdu

摘要

A display panel, a manufacturing method thereof and a display device are provided. The display panel includes a base substrate, the base substrate includes a display region and a peripheral region surrounding the display region, the base substrate includes a first substrate layer, a third substrate layer and a second substrate layer which are sequentially stacked, a material of the second substrate layer includes amorphous silicon. The display region includes a transparent display region, the transparent display region includes a pixel region and a light transmission region, and a thickness of the second substrate layer located in the light transmission region is less than a thickness of at least part of the second substrate layer located outside the transparent display region.

說明書

For example, as shown in FIGS. 2-3B, the second substrate layer 120 located in the transparent display region 221 includes a first pattern 121, and the orthographic projection of the first pattern 121 on the first substrate layer 110 coincides with the orthographic projection of the second electrode 142 on the first substrate layer 110, that is, the first pattern 121 is located in the pixel region 2210. That is to say, the second substrate layer 120 can be patterned with the same mask plate as the second electrode 142 in the organic light emitting element, so as to save the mask plate process. For example, the first substrate layer 110 and the third substrate layer 130 in the embodiment of the present disclosure are continuous integral layers so that the base substrate is a continuous layer. The coincidence of the orthographic projections of the first pattern and the second electrode on the first substrate layer can include a complete coincidence or approximate coincidence of the orthographic projections, and the approximate coincidence of the orthographic projections of the first pattern and the second electrode means that the coincidence rate of the orthographic projections is greater than 95%.

權(quán)利要求

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