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Control method of inspection apparatus and inspection apparatus

專(zhuān)利號(hào)
US12075537B2
公開(kāi)日期
2024-08-27
申請(qǐng)人
Tokyo Electron Limited(JP Tokyo)
發(fā)明人
Hiroaki Agawa
IPC分類(lèi)
G01R31/28; H05B45/12; H05B45/40
技術(shù)領(lǐng)域
led,arrays,correction,correctors,wafer,c12,inspection,twelve,thermal,401a
地域: Tokyo

摘要

A control method of an inspection apparatus including a stage on which a substrate having an inspection object to be inspected is mounted and a plurality of light sources configured to emit light to heat the substrate includes: individually lighting the plurality of light sources and obtaining a plurality of first temperature distributions of the substrate; obtaining a second temperature distribution representing a sum of the plurality of first temperature distributions; obtaining one or more correction values for correcting an amount of light output from at least one or more light sources of the plurality of light sources based on the second temperature distribution; and correcting the amount of light output from each of the at least one or more light sources using the one or more correction values.

說(shuō)明書(shū)

The inspection apparatus 10 is an apparatus that inspects electrical characteristics of each of a plurality of electronic devices (inspection objects) formed on a wafer (a substrate) W. It should be noted that the substrate having the inspections objects is not limited to the wafer W, but may be a carrier on which electronic devices are arranged, a glass substrate, a chip, or the like. The inspection apparatus 10 includes a chamber 12 that houses a stage 11 on which the wafer W is mounted, a loader 13 arranged adjacent to the chamber 12, and a tester 14 arranged over the chamber 12.

The chamber 12 has a housing shape with a hollow inside. Inside the chamber 12, the stage 11 for mounting the wafer W and a probe card 15 that is arranged to face the stage 11 are accommodated. The probe card 15 has a number of needle-shaped probes (contact terminals) 16 arranged corresponding to electrode pads or solder bumps provided corresponding to electrodes of the respective electronic devices of the wafer W.

The stage 11 includes a fixation mechanism (not illustrated) that fixes the wafer W to the stage 11. Thereby, a positional deviation of the wafer W relative to the stage 11 is prevented. The chamber 12 is also provided with a movement mechanism (not illustrated) that moves the stage 11 in the horizontal direction and in the vertical direction. Thereby, the relative position between the probe card 15 and the wafer W is adjusted so that electrode pads or solder bumps provided corresponding to the electrodes of the respective electronic devices contact the respective probes 16 of the probe card 15.

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