A first insulator layer 904 is formed over the substrate 902 and covers the first gate electrode 804 and the electrode 819. The channel conductor region 806 is formed on the first insulator layer 904. A second insulator layer 906 is formed over the first insulator layer 904 and covers the channel conductor region 806.
The intermediate electrode 821 is formed through an opening in the first and second insulator layers 904, 906. The intermediate electrode 821 may be formed as a same conductive or metal layer as the first electrode region 808, which is formed on the second insulator layer 906 and overlaps the first gate electrode 804, a portion of the second gate electrode 819, and the channel conductor region 806. The first electrode region 808 ends at a location that is between ends of the electrode 819. The first electrode region 808 extends from a first end 829 to a second end 831 of the electrode 804. The first electrode region 808 is coupled to a surface (top surface in