What is claimed is:1. A chip-scale atomic beam clock comprising:(a) a micro-optical bench that is fabricated from a silicon-containing material;(b) an atom collimator configured to generate a collimated atomic beam via differential pumping through microchannels within said micro-optical bench;(c) a vertical-cavity surface-emitting laser configured to emit laser photons horizontally in the plane of said micro-optical bench;(d) an in-plane diffraction grating configured to split said laser photons into a first photon beam and a second photon beam; and(e) a first in-plane mirror configured to retroflect said first photon beam, and a second in-plane mirror configured to retroflect said second photon beam, wherein said first and second in-plane mirrors are lithographically defined within said micro-optical bench,wherein said first photon beam and said second photon beam interrogate said collimated atomic beam in-plane with said micro-optical bench.2. The chip-scale atomic beam clock of claim 1, wherein said silicon-containing material is silicon, silica, fused silica, silicates, aluminosilicates, borosilicates, silicon nitrides, silicon oxynitrides, silicon carbides, silicon oxycarbides, or combinations thereof.3. The chip-scale atomic beam clock of claim 1, wherein said collimated atomic beam contains Rb atoms, Cs atoms, Yb atoms, Hg atoms, Sr atoms, Al atoms, Ca atoms, H atoms, or a combination thereof.4. The chip-scale atomic beam clock of claim 1, wherein said in-plane diffraction grating is lithographically defined within said micro-optical bench.5. The chip-scale atomic beam clock of claim 1, wherein said chip-scale atomic beam clock further comprises a first in-plane photodetector configured to detect said first photon beam after being retroflected by said first in-plane mirror, and a second in-plane photodetector configured to detect said second photon beam after being retroflected by said second in-plane mirror.6. The chip-scale atomic beam clock of claim 1, wherein said microchannels are bonded to a contiguous top layer to form a closed environment under vacuum.7. The chip-scale atomic beam clock of claim 6, wherein said microchannels are bonded to said contiguous top layer via direct wafer bonding, anodic bonding, metal-metal bonding, or a combination thereof.8. The chip-scale atomic beam clock of claim 6, wherein said contiguous top layer is a different composition than said silicon-containing material.9. The chip-scale atomic beam clock of claim 6, wherein said contiguous top layer is fabricated from a material that has a coefficient of thermal expansion less than 0.05 ppm/° C. between 25° C. and 300° C.10. The chip-scale atomic beam clock of claim 6, wherein said contiguous top layer is fabricated from alkali-free glass.11. The chip-scale atomic beam clock of claim 6, wherein said contiguous top layer is fabricated from borosilicate glass.12. The chip-scale atomic beam clock of claim 6, wherein a photodetector is mounted on said contiguous top layer to collect photoluminescence from an atom-photon interaction region.13. The chip-scale atomic beam clock of claim 1, wherein said vertical-cavity surface-emitting laser is configured to emit circularly polarized light.14. The chip-scale atomic beam clock of claim 13, wherein said first in-plane mirror is configured to flip the polarization of said first photon beam between left and right, and wherein said second in-plane mirror is configured to flip the polarization of said second photon beam between left and right.15. The chip-scale atomic beam clock of claim 1, wherein said vertical-cavity surface-emitting laser is configured to emit photons with one or more wavelengths selected from about 500 nm to about 2000 nm.16. The chip-scale atomic beam clock of claim 1, wherein said chip-scale atomic beam clock comprises an atom-beam tube configured to contain said collimated atomic beam generated by said atom collimator.17. The chip-scale atomic beam clock of claim 16, wherein said atom-beam tube is configured to be perpendicular to said first photon beam at a first atom-photon interaction region, and wherein said atom-beam tube is configured to be perpendicular to said second photon beam at a second atom-photon interaction region.18. The chip-scale atomic beam clock of claim 1, wherein said atom collimator and said vertical-cavity surface-emitting laser are configured so that collimated atomic beam height and laser photon beam height are the same or about the same.19. The chip-scale atomic beam clock of claim 1, wherein said chip-scale atomic beam clock further comprises an actuator configured to mitigate mis-alignment between said vertical-cavity surface-emitting laser and said micro-optical bench.20. The chip-scale atomic beam clock of claim 1, wherein an outer surface of said chip-scale atomic beam clock is coated with a low-emissivity coating to suppress radiative heat loss.21. The chip-scale atomic beam clock of claim 20, wherein said low-emissivity coating contains gold, silver, copper, aluminum, or a combination thereof.22. The chip-scale atomic beam clock of claim 1, wherein a Helmholtz coil is wrapped around both sides of said micro-optical bench.23. The chip-scale atomic beam clock of claim 1, wherein said chip-scale atomic beam clock is characterized by a long-term ADEV drift less than 6×10?13 after one week of operation.24. The chip-scale atomic beam clock of claim 1, wherein said chip-scale atomic beam clock has a volume of about 10 cm3 or less.25. The chip-scale atomic beam clock of claim 1, wherein said chip-scale atomic beam clock has a weight of about 25 grams or less.26. The chip-scale atomic beam clock of claim 1, wherein said chip-scale atomic beam clock has a power requirement of about 200 mW or less.27. The chip-scale atomic beam clock of claim 1, wherein said chip-scale atomic beam clock is operable over a temperature range from ?40° C. to 85° C.28. The chip-scale atomic beam clock of claim 1, wherein said chip-scale atomic beam clock is operable without Global Positioning System calibration.