For example, the maximum size of the orthographic projection of the cover plate alignment mark 14 on the base substrate 11 in the first direction X is also several hundred microns, such as ranges from about 150 microns to 600 microns, such as about 300 microns to 500 microns, and the size of the orthographic projection of the cover plate alignment mark 14 in the first direction X is smaller than its size in the second direction Y, so as to further improve the identifiability of the cover plate alignment mark 14 and further improve the alignment accuracy.
For example, the orthographic projection of the cover plate alignment mark 14 on the base substrate 11 includes at least one shape selected from a group consisting of a T shape (as illustrated in FIG. 1A), a cross shape, and an L shape, or the orthographic projection of the cover plate alignment mark 14 is in any other easily recognizable shape. For example, the shape of the orthographic projection of the cover plate alignment mark 14 on the base substrate 11 is an integrated structure, for example, the T shape, the cross shape and the L shape are all integrated structures. In other embodiments, the shape of the orthographic projection of the cover plate alignment mark 14 on the base substrate 11 may also include a plurality of discrete portions, for example, the orthographic projection of the alignment mark 14 includes a plurality of spaced concentric circles. Embodiments of the present disclosure include, but are not limited to, these enumerate shapes.