The first insulating layer 201 may include an inorganic insulating material. For example, the first insulating layer 201 may include any one of SiOx, SiNx, and SiON, but the present disclosure is not limited thereto.
The first insulating layer 201 may have a thickness of 200 nm to 700 nm, but the present disclosure is not limited thereto.
A first conductive layer 150 may be disposed on the first insulating layer 201.
The first conductive layer 150 may include any one of aluminum (Al), gold (Au), copper (Cu), titanium (Ti), tungsten (W), molybdenum (Mo), and an alloy thereof, but the present disclosure is not limited thereto.
As shown in
A second insulating layer 202 may be disposed on the first conductive layer 150.
Although the second insulating layer 202 is shown as a single layer in
The second insulating layer 202 may include an inorganic insulating material. For example, the second insulating layer 202 may include any one of SiNx, SiON, and SiOx, but the present disclosure is not limited thereto.