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Electronic device

專利號
US12178090B2
公開日期
2024-12-24
申請人
LG Display Co., Ltd.(KR Seoul)
發(fā)明人
SeHee Park; InTak Cho; PilSang Yun
IPC分類
H10K59/131; G09G3/3291; H10K59/124
技術(shù)領(lǐng)域
layer,insulating,transistor,electrode,gate,active,may,disposed,first,region
地域: Seoul

摘要

Provided is an electronic device. The electronic device includes at least one first transistor to which a data voltage is applied. The first transistor includes a first conductive layer disposed on a substrate and a first active layer, which is disposed on the first conductive layer, has one end and the other end which are made conductive, and includes a first channel region disposed between the one end and the other end. A second conductive layer overlapping the first conductive layer with a first insulating layer interposed between the second conductive layer and the first conductive layer is included in a storage capacitor in a panel, and the storage capacitor is disposed under the first channel region of the first active layer. In this way, an ultra-high definition panel is fabricated.

說明書

The fifth electrode 421 may be disposed on the substrate 400. As shown in FIG. 12, the fifth electrode 421 of the second transistor T2 may include a region branching from the reference voltage line 420 extending in the second direction. However, the embodiments of the present disclosure are not limited thereto, and the fifth electrode 421 may correspond to the reference voltage line 420. In other words, the region branching from the reference voltage line 420 to form the fifth electrode 421 may not be present.

On the substrate 400 on which the fifth electrode 421 is disposed, the first insulating layer 401 may be disposed.

The first conductive layer 450 and the second insulating layer 402 may be sequentially disposed on the first insulating layer 401.

In the first insulating layer 401 and the second insulating layer 402, an eighth hole H8 which exposes a part of the upper surface of the fifth electrode 421 may be provided.

The fifth active layer 440 of the second transistor T2 may be disposed on a part of the upper surface of the second insulating layer 402 and in the eighth hole H8.

The fifth active layer 440 may be an a-Si semiconductor or an oxide semiconductor, but the present disclosure is not limited thereto.

The fifth active layer 440 may include fifth to eighth regions 445 to 448 which are integrally formed.

權(quán)利要求

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