Next, Compound ET1 and LiQ were co-deposited at a weight ratio of 5:5 on the emission layer to form an electron transport layer having a thickness of 360 ?, LiF was deposited on the electron transport layer to form an electron injection layer having a thickness of 5 ?, and Al was vacuum-deposited on the electron injection layer to form a second electrode (i.e., a cathode) having a thickness of 800 ?, thereby completing the manufacture of an organic light-emitting device.
An organic light-emitting device was manufactured in the same manner as in Example 1, except that an emission layer was formed to a thickness of 330 ?.
An organic light-emitting device was manufactured in the same manner as in Example 1, except that, in forming an emission layer, H3-1 was used instead of H3-78.
An organic light-emitting device was manufactured in the same manner as in Example 1, except that, in forming an emission layer, Compounds H2-1 and H1-63 (at a weight ratio of 6.5:3.5) as hosts and Ir-D1 as a dopant were co-deposited at a weight ratio of 88:12 to form an emission layer having a thickness of 330 ?.