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Photoelectric conversion element and imaging device

專利號(hào)
US12178128B2
公開日期
2024-12-24
申請(qǐng)人
Sony Group Corporation(JP Tokyo)
發(fā)明人
Masato Kanno; Yosuke Saito
IPC分類
H10K85/60; H10K30/30; H10K39/32; H10K85/20
技術(shù)領(lǐng)域
electrode,conversion,layer,imaging,in,converter,organic,transistor,formula,image
地域: Tokyo

摘要

A photoelectric conversion element according to an embodiment of the present disclosure includes: a first electrode; a second electrode that is opposed to the first electrode; and an organic photoelectric conversion layer that is provided between the first electrode and the second electrode, and includes, as a first organic semiconductor material, a benzothienobenzothiophene-based compound represented by a general formula (1).

說(shuō)明書

(1-2. Method of Manufacturing Imaging Element)

It is possible to manufacture the imaging element 10A according to the present embodiment as follows, for example.

FIGS. 6 to 10 illustrate a method of manufacturing the imaging element 10A in process order. First, as illustrated in FIG. 6, for example, the p-well 31 is formed as a well of a first conductivity type in the semiconductor substrate 30, and the inorganic photoelectric converters 32G and 32R of a second conductivity type (for example, an n type) are formed in this p-well 31. A p+ region is formed in proximity to the first surface (the surface 30S1) of the semiconductor substrate 30.

權(quán)利要求

1
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